Mechelen, Belgium

Luc Vanooteghem

This inventor holds 1 USPTO granted patent. Top assignee: Agfa-Gevaert. Active years: 1998.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Luc Vanooteghem: Innovator in Lithographic Printing Technology

Introduction

Luc Vanooteghem is a notable inventor based in Mechelen, Belgium. He has made significant contributions to the field of lithographic printing technology. His innovative approach has led to the development of a unique apparatus and method for creating lithographic printing plates.

Latest Patents

Luc Vanooteghem holds a patent for an "Apparatus and method for making a lithographic printing plate." This invention utilizes silver salt diffusion transfer processing. The apparatus includes means for informationwise exposing an imaging element, which consists of a silver halide emulsion layer and a layer containing physical development nuclei. The processing unit features a developing unit that holds an alkaline processing liquid and incorporates guide rollers and plates for transporting the exposed imaging element. Notably, at least one of the guide plates has multiple apertures to ensure even distribution of the alkaline processing fluid near the imaging element's surface. He has 1 patent to his name.

Career Highlights

Luc Vanooteghem is associated with Agfa-Gevaert, a leading company in imaging technology. His work at Agfa-Gevaert has allowed him to focus on advancing lithographic printing methods. His contributions have been instrumental in enhancing the efficiency and quality of printing processes.

Collaborations

Luc has collaborated with Alfons J Bertels, a fellow innovator in the field. Their partnership has fostered advancements in lithographic technology and has contributed to the success of their projects.

Conclusion

Luc Vanooteghem's innovative work in lithographic printing technology exemplifies the impact of dedicated inventors in the industry. His patent and contributions continue to influence the field positively.

Profile summary based on public USPTO records.
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