Tamins, Switzerland

Luc Scherrer

This inventor holds 1 USPTO granted patent and 2 published patent applications, plus 1 CIPO patent and 3 EPO patents. Top assignee: Ems-Patent Ag. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luc Scherrer. Retrieved from https://idiyas.com/inventor/luc-scherrer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Luc Scherrer: Innovator in Transparent Polyamide-Imides

Introduction

Luc Scherrer is a notable inventor based in Tamins, Switzerland. He has made significant contributions to the field of materials science, particularly with his work on transparent polyamide-imides. His innovative approach has led to advancements that are valuable in various applications.

Latest Patents

Luc Scherrer holds a patent for a transparent polyamide-imide. This invention is based on one or more different imido-dicarboxylic acids or derivatives thereof, and cycloaliphatic diamines comprising 6 to 24 carbon atoms. The patent describes the structural formulas of the imido-dicarboxylic acids, showcasing the complexity and utility of his work.

Career Highlights

Luc Scherrer is associated with Ems-Patent AG, where he continues to develop and refine his innovative ideas. His career is marked by a commitment to advancing material technologies that can have a lasting impact on various industries.

Collaborations

Luc has collaborated with notable colleagues such as Botho Hoffmann and Heinz G Hoff. These partnerships have fostered an environment of innovation and creativity, contributing to the success of their projects.

Conclusion

Luc Scherrer is a distinguished inventor whose work on transparent polyamide-imides exemplifies the spirit of innovation. His contributions to materials science are noteworthy and continue to influence the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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