Berchem, Belgium

Luc K Martens

This inventor holds 1 USPTO granted patent. Top assignee: Agfa Gevaert Nv. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luc K Martens. Retrieved from https://idiyas.com/inventor/luc-k-martens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Luc K Martens: Innovator in Photographic Technology

Introduction

Luc K Martens is a notable inventor based in Berchem, Belgium. He has made significant contributions to the field of photographic technology, particularly in the area of dispersing photographic adjuvants.

Latest Patents

Luc K Martens holds a patent for a method of dispersing photographic adjuvants in a hydrophilic colloid. This innovative method involves the use of at least one high-boiling, substantially water-insoluble oil-former from the class of 1,3-dialkyloxy-2-propanols and the carboxylic, phosphoric, or phosphonic esters thereof. This patent is crucial for forming a water-permeable photosensitive or non-photosensitive colloid layer of a photographic silver halide element.

Career Highlights

Luc K Martens is associated with Agfa Gevaert NV, a company renowned for its advancements in imaging technology. His work has contributed to the development of new methods that enhance the quality and efficiency of photographic materials.

Collaborations

Luc has collaborated with notable coworkers such as Christian C Van De Sande and Jan J Vandewalle. Their combined expertise has fostered innovation within their projects.

Conclusion

Luc K Martens is a distinguished inventor whose work in photographic technology has led to valuable advancements in the field. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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