Lu Wu

Title: Innovations of Lu Wu in Ultrasonic Polishing Technology

Introduction

Lu Wu is an accomplished inventor based in Hangzhou, China. He has made significant contributions to the field of polishing technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing processes using advanced ultrasonic techniques.

Latest Patents

Lu Wu holds a patent for a "Floating non-contact ultrasonic enhanced flexible sub-aperture polishing device and method." This invention features a sophisticated design that includes an X-axis moving platform, a Y-axis moving platform, a Z-axis moving platform, and a workpiece swinging platform. These components work in linkage control to maintain the alignment of the tool and workpiece at an identical angle, enabling precise sub-aperture processing. The device utilizes air pressure to create axial thrust, allowing the tool to float, while dynamic balance among hydrodynamic pressure, air pressure, and dynamic pressure optimizes the polishing liquid's performance. The invention also generates a shearing force for material removal through a tiny gap formed by the flexible tool's elastic deformation, enhanced by ultrasonic waves that create a cavitation effect.

Career Highlights

Lu Wu is affiliated with Zhejiang University, where he continues to advance his research and development in polishing technologies. His innovative approach has garnered attention in the academic and industrial sectors, showcasing his commitment to improving manufacturing processes.

Collaborations

Lu Wu collaborates with notable colleagues, including Wule Zhu and Fang Han, who contribute to his research endeavors. Their combined expertise fosters a dynamic environment for innovation and development in their field.

Conclusion

Lu Wu's contributions to ultrasonic polishing technology exemplify the impact of innovative thinking in engineering. His patent reflects a significant advancement in the field, promising to enhance manufacturing processes and efficiency.