Company Filing History:
Years Active: 1978-1982
Title: Louis R. Thibault: Innovator in Charged-Particle-Beam Lithography
Introduction
Louis R. Thibault is a notable inventor based in Piscataway, NJ (US). He has made significant contributions to the field of charged-particle-beam lithography, holding a total of 3 patents. His work has advanced the technology used in the fabrication of large-scale integrated circuits.
Latest Patents
Thibault's latest patents include innovative methods for reducing charging effects in charged-particle-beam lithography. In this patent, he addresses the issue of charge accumulation on the workpiece during alignment or writing, which can lead to significant pattern placement errors. He proposes a film formed directly under the resist layer to act as a charge-conducting medium during lithography. This film is highly compatible with standard lithographic and etching processes used in the fabrication of LSI and VLSI circuits.
Another significant patent focuses on the fabrication of small contact openings in large-scale integrated devices. In this invention, a thin layer of polysilicon is deposited on an underlying region where electrical contacts are to be made. The polysilicon is selectively masked by a patterned silicon nitride layer, allowing for the formation of contact windows. This innovative approach enhances the efficiency of creating conductive regions in defined windows.
Career Highlights
Louis R. Thibault has had a distinguished career at Bell Telephone Laboratories, where he has contributed to various advancements in technology. His work has been instrumental in improving the processes involved in semiconductor manufacturing.
Collaborations
Thibault has collaborated with notable coworkers, including Leopoldo Dy Yau and Arthur C. Adams. Their combined expertise has furthered the development of innovative solutions in the field of lithography.
Conclusion
Louis R. Thibault's contributions to charged-particle-beam lithography have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to influence advancements in technology.