Palaiseau, France

Louis Duveau

This inventor holds 1 USPTO granted patent. Top assignee: Office National D'etudes Et De Recherches Aerospatiales. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Louis Duveau. Retrieved from https://idiyas.com/inventor/louis-duveau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Louis Duveau: Inventor of a Compact Three-Mirror Imaging System

Introduction

Louis Duveau is an inventor associated with Palaiseau, France, and the Office National d’Études et de Recherches Aérospatiales (ONERA). His patent work includes an optical imaging system designed to reduce stray light while maintaining a wide field of view, high aperture, and compact dimensions.

Latest Patents

Duveau is associated with 1 patent: “Imaging Optical System Comprising Three Mirrors.” The invention describes a three-mirror imaging system configured to block stray rays that could otherwise reach its image sensor. It also describes two entrance baffles positioned on opposite sides of the system’s optical entrance. These baffles intercept rays from fields angularly distant from the useful entrance field, allowing shorter upstream baffles and a more compact system.

Career Highlights

Duveau’s listed patent reflects work in optical system design, particularly in managing stray light while balancing image quality, aperture, field of view, and compactness. His company affiliation is ONERA, a French aerospace research organization.

Collaborations

Duveau’s listed coworker is Guillaume Druart. Their association is connected with the three-mirror imaging system patent.

Conclusion

Louis Duveau’s patent describes a compact optical imaging system that combines stray-ray control with the potential for wide fields and high apertures.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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