Louis D Calitz

Title: Louis D. Calitz: Innovator in Wafer Surface Inspection Technology

Introduction

Louis D. Calitz is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of wafer surface inspection technology. His innovative approach has led to the development of a patented method that enhances the efficiency and accuracy of inspecting wafer surfaces.

Latest Patents

Calitz holds a patent for a "Method and system for inspecting the surface of a wafer." This invention presents an improved wafer surface inspection system. In one embodiment, the system includes a translation stage that generates relative motion between an object viewing device, such as an objective lens, and the surface of the object being inspected. The translation stage controller manages the relative movement and determines current coordinates for both the object surface and the viewing device. It compares these coordinates to target coordinates generated by a processor and generates a trigger signal when a match occurs. A camera captures an image through the object viewing device in response to this trigger signal. This method allows for the quick and efficient acquisition of a white light image of an entire wafer surface. Image processing software can then identify solder bumps on the wafer surface and calculate their parameters. Quality control criteria are automatically applied to assess the suitability of the wafer for further processing.

Career Highlights

Calitz is associated with Ultrapointe Corporation, where he has been instrumental in advancing wafer inspection technologies. His work has significantly impacted the quality control processes in semiconductor manufacturing.

Collaborations

Calitz has collaborated with notable colleagues, including Kexing Cecilia Du and M. Kent Norton. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Louis D. Calitz is a pioneering inventor whose work in wafer surface inspection technology has set new standards in the industry. His patented methods enhance the efficiency of quality control in semiconductor manufacturing, showcasing his significant contributions to innovation.