Oakdale, MN, United States of America

Louis C Belisle, Deceased

This inventor holds 2 USPTO granted patents. Top assignee: 3M Innovative Properties Company. Active years: 1999-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Louis C Belisle, Deceased. Retrieved from https://idiyas.com/inventor/louis-c-belisle-deceased

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1999-2000

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2 patents (USPTO):Explore Patents

Title: Louis C. Belisle: Innovator in Retroreflective Technology

Introduction

Louis C. Belisle was a notable inventor known for his contributions to retroreflective technology. He was based in Oakdale, MN (US) and held a total of 2 patents during his career. His work has had a lasting impact on the field of reflective materials.

Latest Patents

Belisle's latest patents include a method of making wet retroreflective marking material. This innovative method involves several steps, including providing an enclosed-lens retroreflective sheet and applying a conformance layer to enhance its functionality. Another significant patent is for a high entrance angle retroreflective article, which effectively provides retroreflective brightness at both very high and low entrance angles.

Career Highlights

Throughout his career, Belisle was associated with 3M Innovative Properties Company, where he developed groundbreaking technologies in retroreflective materials. His work has contributed to advancements in safety and visibility in various applications.

Collaborations

Belisle collaborated with several talented individuals, including Larry K. Stump and Terry R. Bailey. These collaborations helped foster innovation and enhance the quality of the projects they worked on together.

Conclusion

Louis C. Belisle's contributions to retroreflective technology have left a significant mark in the industry. His innovative methods and patents continue to influence the development of reflective materials today.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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