Sterrebeek, Belgium

Louis Buekenhout

This inventor holds 1 USPTO granted patent. Top assignee: Innovative Sputtering Technology. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Louis Buekenhout. Retrieved from https://idiyas.com/inventor/louis-buekenhout

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Louis Buekenhout: Innovator in ITO Alloy Manufacturing

Introduction

Louis Buekenhout is a notable inventor based in Sterrebeek, Belgium. He has made significant contributions to the field of materials science, particularly in the manufacturing of ITO alloy articles. His innovative approach has led to the development of a patented process that enhances the efficiency and quality of these materials.

Latest Patents

Louis holds a patent for a "Process for manufacturing ITO alloy articles." This patent represents a key advancement in the production techniques for indium tin oxide (ITO) materials, which are widely used in various electronic applications.

Career Highlights

Louis Buekenhout is currently employed at Innovative Sputtering Technology, where he applies his expertise in materials engineering. His work focuses on developing advanced sputtering techniques that improve the performance of ITO alloy products. With a total of 1 patent, he has established himself as a valuable contributor to the field.

Collaborations

Louis collaborates with talented professionals in his field, including coworkers Paul Lippens and Ludo Froyen. Together, they work on innovative projects that push the boundaries of materials science and engineering.

Conclusion

Louis Buekenhout's contributions to the manufacturing of ITO alloy articles highlight his role as an innovator in the field. His patent and work at Innovative Sputtering Technology demonstrate his commitment to advancing technology in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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