Company Filing History:
Years Active: 2006
Title: Innovations by Louie Liù in Semiconductor Technology
Introduction
Louie Liù is a notable inventor based in Meridian, ID (US), recognized for his contributions to semiconductor technology. With a focus on improving the efficiency and reliability of gate stack formation, Liù has made significant strides in the field.
Latest Patents
Liù holds a patent for a method of forming a gate stack. This innovative method minimizes or eliminates damage to the gate dielectric layer and silicon substrate during the gate stack formation process. By reducing the temperature during formation, the invention prevents the formation of silicon clusters within the metallic silicide film in the gate stack, which can cause damage during the gate etch step. Additionally, the patent includes methods for dispersing silicon clusters prior to the gate etch step, further enhancing the reliability of the process.
Career Highlights
Liù is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to apply his innovative ideas and contribute to advancements in technology.
Collaborations
Liù has collaborated with esteemed colleagues such as Pai-Hung Pan and Ravi T Iyer, working together to push the boundaries of semiconductor technology.
Conclusion
Louie Liù's innovative approach to gate stack formation has the potential to significantly impact the semiconductor industry. His patent reflects a commitment to enhancing the reliability and efficiency of semiconductor devices.