Otterbach, Germany

Lother Brühl

This inventor holds 1 USPTO granted patent. Top assignee: G.m. Pfaff Aktiengesellschaft. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lother Brühl. Retrieved from https://idiyas.com/inventor/lother-branduumlhl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Lother Brühl: Innovator in Sewing Machine Technology

Introduction

Lother Brühl is a notable inventor based in Otterbach, Germany. He has made significant contributions to the field of sewing machine technology. His innovative approach has led to the development of a unique patent that enhances the functionality of sewing machines.

Latest Patents

Lother Brühl holds a patent for a sewing machine with speed-dependent stitch correction. This invention addresses the challenge of maintaining consistent stitch length by compensating for speed variations. The technology allows for a linear stitch length desired value curve, ensuring precision in sewing.

Career Highlights

Brühl is associated with G.m. Pfaff Aktiengesellschaft, a company renowned for its advancements in sewing technology. His work has contributed to the company's reputation for innovation and quality in the sewing machine industry.

Collaborations

Throughout his career, Lother Brühl has collaborated with talented individuals such as Edgar Butzen and Karl-Ludwig Manuel. These partnerships have fostered a creative environment that encourages the development of cutting-edge sewing solutions.

Conclusion

Lother Brühl's contributions to sewing machine technology exemplify the spirit of innovation. His patent for speed-dependent stitch correction showcases his commitment to enhancing the sewing experience. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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