Hurth, DE, United States of America

Lothar Sterck

This inventor holds 1 USPTO granted patent. Top assignee: Davy International Aktiengesellschaft. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lothar Sterck. Retrieved from https://idiyas.com/inventor/lothar-sterck-f0zluka9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Lothar Sterck: Innovator in Phthalic Anhydride Separation

Introduction

Lothar Sterck is a notable inventor based in Hürth, Germany. He has made significant contributions to the field of chemical engineering, particularly in the separation of phthalic anhydride. His innovative approach has led to advancements in the efficiency of chemical processes.

Latest Patents

Lothar Sterck holds a patent for a process that allows for the continuous separation of phthalic anhydride from the reaction gas mixture formed by the catalytic oxidation of o-xylene and/or naphthalene. This process involves treating the reaction gas mixture with a maleic anhydride absorbent, which enhances the separation efficiency.

Career Highlights

Sterck is associated with Davy International Aktiengesellschaft, where he has applied his expertise in chemical processes. His work has been instrumental in improving industrial applications related to phthalic anhydride production.

Collaborations

Throughout his career, Lothar has collaborated with esteemed colleagues such as Gerhard Keunecke and Anton Klopfer. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Lothar Sterck's contributions to the field of chemical engineering, particularly in the separation of phthalic anhydride, highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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