Coburg, Germany

Lothar Schönfelder

This inventor holds 1 USPTO granted patent. Top assignee: Bayer Aktiengesellschaft. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lothar Schönfelder. Retrieved from https://idiyas.com/inventor/lothar-schandoumlnfelder

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Lothar Schönfelder - Innovator in Silicon Coating Technologies

Introduction

Lothar Schönfelder, a talented inventor based in Coburg, Germany, has made significant contributions to the field of materials science. With his innovative approach to substrate coating, he has developed a unique process that leverages silicon compounds to enhance the properties of various materials.

Latest Patents

Schönfelder holds a patent for a novel method titled "Process for coating substrates with a silicon-containing layer." This invention employs chemical vapor deposition to apply a silicon-containing protective layer, effectively improving the durability and performance of substrates used in various applications.

Career Highlights

Currently, Lothar Schönfelder is associated with Bayer Aktiengesellschaft, a leading company known for its research and development in innovative chemical solutions. His expertise in coating technology has positioned him as a key player in the advancement of protective coatings.

Collaborations

Throughout his career, Schönfelder has had the privilege of collaborating with esteemed colleagues such as Hans-Peter Baldus and Gerd Passing. Their combined efforts have greatly influenced the development of innovative solutions in coating technologies, further enhancing the capabilities of their research team.

Conclusion

Lothar Schönfelder exemplifies the innovative spirit of inventors who push the boundaries of technology for practical applications. His contributions to silicon coating processes reflect the importance of continuous research and collaboration in driving advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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