Munich, Germany

Lothar Bohn

This inventor holds 1 USPTO granted patent. Top assignee: Hoechst Aktiengesellschaft. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lothar Bohn. Retrieved from https://idiyas.com/inventor/lothar-bohn-niu4d82w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Lothar Bohn: Innovator in Polyamide Technology

Introduction

Lothar Bohn is a notable inventor based in Munich, Germany. He has made significant contributions to the field of polyamide technology, particularly through his innovative patent. His work focuses on creating materials that combine high transparency with excellent thermal and mechanical properties.

Latest Patents

Lothar Bohn holds a patent for "Crystal-clear polyamides from 1,3-bis(aminomethyl)cyclohexane." This patent discloses and claims novel polyamides based on 1,3-bis-(aminomethyl)-cyclohexane or mixtures thereof with 1,4-bis-(aminomethyl)-cyclohexane, along with one or several aromatic dicarboxylic acids and one or several aliphatic amino-carboxylic acids. The resulting polyamides exhibit high transparency, good form stability at elevated temperatures, and impressive hardness and impact strength.

Career Highlights

Lothar Bohn is associated with Hoechst Aktiengesellschaft, where he has been instrumental in advancing polyamide technology. His innovative approach has led to the development of materials that are not only functional but also versatile in application.

Collaborations

Lothar Bohn has collaborated with Ludwig Brinkmann, contributing to the advancement of their shared goals in material science. Their partnership has fostered innovation and development in the field.

Conclusion

Lothar Bohn's contributions to polyamide technology through his patent demonstrate his commitment to innovation and excellence in material science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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