This inventor holds 14 USPTO granted patents, plus 5 CIPO patents and 2 EPO patents. Top assignees: Dongjiang Environmental Co., Ltd., Guangdong Deerma Technology Co., Ltd., Guangzhou Gtd Lighting Technology Co., Ltd.. Active years: 2019-2025.
Location History:
- Guangzhou, CN (2023)
- Guangdong, CN (2019 - 2024)
Company Filing History:
Years Active: 2019-2025
Title: Long Chen - Innovator in Electronic-Grade Copper Chloride Preparation
Introduction
Long Chen is a prominent inventor based in Guangdong, China. He has made significant contributions to the field of materials science, particularly in the preparation of electronic-grade copper chloride dihydrate. With a total of 14 patents to his name, Chen's work has garnered attention for its innovative approaches and practical applications.
Latest Patents
One of Long Chen's latest patents is a preparation method for electronic-grade copper chloride dihydrate. This method involves dissolving a copper salt in a hydrochloric acid solution to create a copper salt solution. The process includes two solid-liquid separations, which consist of an adhesive separation using waste PCB board powder and a co-precipitation separation with tin chloride compound. The final steps involve adjusting the pH of the filtrate, evaporating to a supersaturated solution, and performing cooling crystallization.
Career Highlights
Throughout his career, Long Chen has worked with notable companies such as Dongjiang Environmental Co., Ltd. and Guangdong Deerma Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Long Chen has collaborated with several professionals in his field, including Wenwu Li and Junqiang Zhu. These partnerships have facilitated the exchange of ideas and have led to advancements in their respective areas of expertise.
Conclusion
Long Chen's contributions to the field of electronic-grade copper chloride preparation highlight his innovative spirit and dedication to advancing materials science. His patents and collaborations reflect a commitment to excellence and a drive to push the boundaries of technology.