Company Filing History:
Years Active: 1993-2015
Title: Lon J Wilson: Innovator in Carbon Nanotubes and Fullerene Technologies
Introduction
Lon J Wilson is a prominent inventor based in Houston, TX (US). He has made significant contributions to the fields of carbon nanotubes and fullerene technologies. With a total of 7 patents, Wilson's work has advanced the understanding and application of these materials in various scientific and medical fields.
Latest Patents
Wilson's latest patents include innovative compositions and methods related to carbon nanotubes. One notable patent focuses on carbon nanotube-based imaging agents. This invention involves imaging agents that comprise carbon nanotubes internally loaded with a contrast agent. The method for imaging includes introducing the imaging agent into a cell and subsequently imaging the cell to detect the presence of the imaging agent. Another significant patent involves fullerene compositions and methods for photochemical purification. This patent describes fullerene derivatives capable of photocatalytically generating reactive oxygen species in the presence of ultraviolet and/or visible light. These derivatives can be used in photocatalytic disinfection systems to remove various contaminants, including bacteria, viruses, and chemical pollutants.
Career Highlights
Throughout his career, Wilson has worked with esteemed organizations such as William Marsh Rice University and E.R. Squibb & Sons, Inc. His work in these institutions has allowed him to collaborate with other experts in the field and contribute to groundbreaking research.
Collaborations
Wilson has collaborated with notable individuals, including Uri Sagman and Yuri Mackeyev. These collaborations have further enriched his research and innovations in the field.
Conclusion
Lon J Wilson's contributions to carbon nanotube and fullerene technologies have positioned him as a key figure in innovation. His patents reflect a commitment to advancing scientific knowledge and practical applications in various industries.