Vancouver, Canada

Lok Lam Yeung

This inventor holds 14 USPTO granted patents and 1 published patent application. Top assignee: Lululemon Athletica Canada, Inc.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lok Lam Yeung. Retrieved from https://idiyas.com/inventor/lok-lam-yeung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 85.7

Average Co-Inventor Count = 1.1

ph-index = 4

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2022-2026

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14 patents (USPTO):Explore Patents

Title: Innovations of Lok Lam Yeung

Introduction

Lok Lam Yeung is a prominent inventor based in Vancouver, Canada. He has made significant contributions to the field of garment technology, holding a total of 10 patents. His work is recognized for its innovative approach to enhancing the functionality and design of clothing.

Latest Patents

Among his latest patents, Lok Lam Yeung has developed advanced garment technologies that aim to improve comfort and performance. These innovations reflect his commitment to pushing the boundaries of what is possible in the apparel industry.

Career Highlights

Lok Lam Yeung is currently employed at Lululemon Athletica Canada, Inc., where he continues to innovate and contribute to the company's mission of creating high-quality athletic wear. His expertise and creativity have made him a valuable asset to the team.

Collaborations

Some of his notable coworkers include Sze Wing Leung and Joanne Loui, who collaborate with him on various projects within the company. Their combined efforts contribute to the development of cutting-edge products that meet the needs of consumers.

Conclusion

Lok Lam Yeung's work exemplifies the spirit of innovation in the garment industry. His patents and contributions continue to shape the future of athletic wear, making him a key figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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