This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: 3D Systems, Inc., Huntsman Advanced Materials Americas LLC. Active years: 2011-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Riedisheim, FR (2011)
- Blotzheim, FR (2013)
Company Filing History:
Years Active: 2011-2013
Title: Loic Messe: Innovator in Photocurable Compositions
Introduction
Loic Messe is a notable inventor based in Blotzheim, France. He has made significant contributions to the field of photocurable compositions, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
Messe's latest patents include a curable composition that provides a versatile resin suitable for coatings and applications in stereolithography and three-dimensional printing. This invention allows for the formation of 3D objects, demonstrating his commitment to advancing technology in this area. Another significant patent is focused on a dual photoinitiator, photocurable composition, which comprises two different cationic photoinitiators. This invention not only details the composition but also outlines its use and the process for producing three-dimensional articles.
Career Highlights
Throughout his career, Loic Messe has worked with prominent companies such as Huntsman Advanced Materials Americas LLC and 3D Systems, Inc. His experience in these organizations has undoubtedly contributed to his innovative work in photocurable technologies.
Collaborations
Messe has collaborated with talented individuals in his field, including Carole Chapelat and John Wai Fong. These partnerships have likely enriched his research and development efforts.
Conclusion
Loic Messe's contributions to photocurable compositions reflect his dedication to innovation and technology. His patents and career achievements highlight his role as a significant figure in the field of 3D printing and materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile