Liwen Li

Title: Innovations of Liwen Li in MEMS Technology

Introduction

Liwen Li is a notable inventor based in Hangzhou, China, recognized for his contributions to the field of microelectromechanical systems (MEMS). He holds two patents that showcase his innovative approaches to semiconductor processes. His work is instrumental in advancing MEMS technology, particularly in the area of sealing cap wafers.

Latest Patents

Liwen Li's latest patents include a method for forming multiple silicon trenches for MEMS sealing cap wafers and an etching mask structure. This method involves several steps, starting with providing a MEMS sealing cap silicon substrate. It includes forming stacked mask layers on the substrate, followed by photolithography and etching to create etching windows. The process allows for the etching of the silicon substrate using the uppermost mask layer, and it continues until all mask layers are removed. This innovative approach enables the formation of deep trenches with a high aspect ratio, overcoming challenges associated with conventional spin coating on sealing cap wafers.

Career Highlights

Liwen Li is currently employed at Hangzhou Silan Integrated Circuit Co., Ltd., where he applies his expertise in semiconductor technology. His work has significantly impacted the development of MEMS devices, enhancing their functionality and reliability.

Collaborations

Liwen collaborates with talented colleagues, including Yongxiang Wen and Chen Liu, who contribute to the innovative environment at their company. Their teamwork fosters creativity and drives advancements in MEMS technology.

Conclusion

Liwen Li's contributions to MEMS technology through his innovative patents and collaborative efforts highlight his role as a key inventor in the field. His work continues to influence the development of advanced semiconductor processes, paving the way for future innovations.