JiangXi, China

Liufeng Liang

This inventor holds 1 USPTO granted patent. Top assignee: Jiangxi Lianchuang Electronic Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liufeng Liang. Retrieved from https://idiyas.com/inventor/liufeng-liang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 3.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Liufeng Liang - Innovator in Optical Technology

Introduction

Liufeng Liang is a notable inventor based in Jiangxi, China. He has made significant contributions to the field of optical technology, particularly in the development of advanced imaging devices. His innovative work has led to the creation of a unique ultra wide angle lens that enhances imaging capabilities.

Latest Patents

Liufeng Liang holds 1 patent for his invention titled "Ultra wide angle lens and imaging device." This patent describes an ultra wide angle lens designed for an imaging device, which includes a series of lenses with varying optical powers. The configuration consists of a first lens with a negative optical power, followed by additional lenses that collectively improve the imaging quality and field of view.

Career Highlights

Liang is currently employed at Jiangxi Lianchuang Electronic Co., Ltd., where he continues to innovate in the field of optics. His work at the company has positioned him as a key player in the development of advanced imaging technologies.

Collaborations

Liufeng Liang collaborates with talented coworkers, including Yumin Bao and Jiyong Zeng. Their combined expertise contributes to the success of their projects and the advancement of optical technology.

Conclusion

Liufeng Liang's contributions to the field of optical technology through his innovative lens design exemplify the impact of dedicated inventors in advancing imaging devices. His work continues to inspire future developments in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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