This inventor holds 2 USPTO granted patents. Top assignees: Microsoft Technology Licensing, LLC, Semiconductor Manufacturing North China (Beijing) Corporation. Active years: 2026.
Company Filing History:
1 out of 56,162 
1 out of 4 Years Active: 2026
Title: Lisha Ma: Innovator in Semiconductor Technology and Speech Recognition
Introduction
Lisha Ma is a prominent inventor based in Beijing, China. She has made significant contributions to the fields of semiconductor technology and speech recognition. With a total of 2 patents, her work showcases her innovative spirit and technical expertise.
Latest Patents
Lisha Ma's latest patents include a semiconductor structure and a method for forming the same. This patent describes a method that involves forming discrete poly gate layers on a base of a first region and a second region. The poly gate layer of the first region includes a bottom gate layer and a top gate layer that protrudes out of the bottom gate layer, defining a groove. Additionally, a polish block layer is formed on the sidewall of the groove. The second patent focuses on a method and system for detecting and improving real-time mispronunciation of words. This method enhances pronunciation during speech by analyzing audio data, scoring the speech, and identifying mispronounced words.
Career Highlights
Throughout her career, Lisha Ma has worked with notable companies such as Microsoft Technology Licensing, LLC and Semiconductor Manufacturing North China (Beijing) Corporation. Her experience in these organizations has contributed to her development as an inventor and innovator.
Collaborations
Lisha has collaborated with talented individuals, including Amit Srivastava and Runnan Li. These partnerships have allowed her to expand her knowledge and expertise in her fields of interest.
Conclusion
Lisha Ma is a remarkable inventor whose work in semiconductor technology and speech recognition has made a significant impact. Her innovative patents and collaborations highlight her dedication to advancing technology.