Liping D Hou

Title: Innovations of Liping D Hou

Introduction

Liping D Hou is a notable inventor based in Rancho Palos Verdes, California. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on processes that enhance the fabrication and performance of semiconductor devices.

Latest Patents

One of his latest patents is titled "Process for providing clean lift-off of sputtered thin film layers." This innovative photoresist process achieves clean and complete lift-off of thin film layers, such as those formed on a semiconductor substrate. The process utilizes a reentrant photoresist profile that breaks the continuity of the thin film layer, ensuring a clean lift-off without requiring additional processing steps. Another significant patent is the "Method of fabricating a self-aligned double recess gate profile." This method involves creating a self-aligned double gate recess profile in a semiconductor substrate, which is particularly applicable to GaAs MESFETs.

Career Highlights

Liping D Hou has worked with prominent companies in the aerospace and technology sectors, including Hughes Aircraft Company and Rockwell International Corporation. His experience in these organizations has contributed to his expertise in semiconductor fabrication techniques.

Collaborations

Some of his notable coworkers include Tom Y Chi and Danny Li, who have collaborated with him on various projects throughout his career.

Conclusion

Liping D Hou's innovative patents and extensive experience in the semiconductor industry highlight his significant contributions to technology. His work continues to influence advancements in semiconductor fabrication processes.