Lioudmila D Kisterskaya

Title: Lioudmila D Kisterskaya: Innovator in Ion Sputtering Technology

Introduction

Lioudmila D Kisterskaya is a prominent inventor based in Providence, RI (US). She has made significant contributions to the field of ion sputtering technology. Her innovative work has led to the development of a unique apparatus that enhances the efficiency of localized ion sputtering processes.

Latest Patents

Kisterskaya holds a patent for an "Apparatus and method for localized ion sputtering." This invention consists of a vacuum chamber, an anode and cathode arranged in spaced relation, and a power supply that generates an electric field between the two electrodes. The apparatus is designed to direct a stream of plasma-forming gas tangent to the target surface of the cathode. The electric field ionizes the gas, allowing ions to bombard the cathode surface and strip away material, which is then deposited onto a substrate. This technology has applications in sputtering planar surfaces, selected areas of planar surfaces, and coating the inner surfaces of openings in printed circuit boards.

Career Highlights

Kisterskaya is associated with Tabco Technologies, Inc., where she continues to advance her research and development efforts. Her work has been instrumental in improving the efficiency and effectiveness of ion sputtering techniques.

Collaborations

Some of her notable coworkers include Thomas A Barber and Leonid L Kistersky. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Lioudmila D Kisterskaya is a trailblazer in the field of ion sputtering technology, with her innovative patent showcasing her expertise and dedication to advancing this area of research. Her contributions continue to impact the industry positively.