Ramat Hasharon, Israel

Lior Stein

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Gm Global Technolgoy Operations, Inc.. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Lior Stein - Innovator in Camera Alignment Technology

Introduction

Lior Stein is a notable inventor based in Ramat Hasharon, Israel. He has made significant contributions to the field of camera technology, particularly in the area of image alignment correction. His innovative approach has the potential to enhance the performance of surround cameras in various applications.

Latest Patents

Lior Stein holds a patent for a method and system titled "Perturbative alignment correction for surround cameras." This invention focuses on correcting the alignment of images received from cameras by estimating camera alignment parameters based on perturbative correction. The corrected alignment parameters are designed to satisfy pairwise epipolar constraints as well as global loop closure constraints. The estimation is achieved as a Least-Mean-Square solution to a system of linear equations, and the algorithm can be implemented as part of a Random Sample Consensus criterion for improved robustness. This method is noted for its speed and efficiency, making it suitable for real-time systems.

Career Highlights

Lior Stein is currently employed at Gm Global Technology Operations, Inc., where he continues to develop innovative solutions in camera technology. His work has positioned him as a key figure in the advancement of image processing techniques.

Collaborations

Lior collaborates with talented professionals in his field, including Avi Resler and Michael Slutsky. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Lior Stein's contributions to camera alignment technology demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the field, showcasing his ability to solve complex problems effectively.

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