Beijing, China

Linlin Xin

This inventor holds 1 USPTO granted patent. Top assignee: Jingcheng Workshop Electronic Integration Technology (Beijing) Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Linlin Xin. Retrieved from https://idiyas.com/inventor/linlin-xin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Linlin Xin - Innovator in Skin Analysis Technology.

Introduction

Linlin Xin is a notable inventor based in Beijing, China. She has made significant contributions to the field of skin analysis technology. Her innovative approach focuses on analyzing the water content of skin through advanced imaging techniques.

Latest Patents

Linlin Xin holds a patent for a "Method and device for analyzing water content of skin by means of skin image." This invention discloses a method and device that performs skin feature analysis on acquired skin images. The analysis allows for the determination of skin water content based on features such as glossiness and smoothness levels. The invention demonstrates a reduction in implementation costs compared to prior art and achieves rapid testing.

Career Highlights

Linlin Xin is associated with Jingcheng Workshop Electronic Integration Technology (Beijing) Co., Ltd. Her work at this company emphasizes her commitment to advancing technology in skin analysis.

Collaborations

Linlin Xin collaborates with talented individuals such as Xianrong Qiu and Limin Zhou. Their teamwork enhances the innovative capabilities within their projects.

Conclusion

Linlin Xin's contributions to skin analysis technology reflect her dedication to innovation and improvement in the field. Her patent showcases a practical solution that benefits both the industry and consumers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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