Linh Da Ho

Title: Linh Da Ho: Innovator in Substrate Processing Technology

Introduction

Linh Da Ho is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, particularly in methods for removing organic films from substrates. With a total of 2 patents to his name, Linh's work is recognized for its innovative approach and practical applications.

Latest Patents

Linh Da Ho's latest patents focus on a substrate processing method and apparatus designed to enhance the efficiency of organic film removal. The method involves several key steps: first, introducing an ozone-containing gas into a substrate processing chamber to fill the space above the substrate. Next, a heated chemical liquid containing sulfuric acid is sprayed onto the substrate. This process is carefully controlled, with the spraying continuing for a specified duration before being stopped. This innovative approach aims to improve the effectiveness of substrate processing in various applications.

Career Highlights

Linh Da Ho is currently employed at Screen Holdings Co., Ltd., where he continues to develop and refine his innovative technologies. His work has garnered attention within the industry, showcasing his expertise in substrate processing methods. Linh's contributions are vital to advancing the capabilities of substrate processing technologies.

Collaborations

Linh has had the opportunity to work alongside talented colleagues, including Masaki Inaba and Kei Suzuki. These collaborations have further enriched his research and development efforts, fostering a creative environment for innovation.

Conclusion

Linh Da Ho is a notable inventor whose work in substrate processing technology has made a significant impact. His innovative methods and collaborative spirit continue to drive advancements in the field.