Chengdu, China

Lingna Yue

This inventor holds 1 USPTO granted patent. Top assignee: University of Electronic Science and Technology of China. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lingna Yue. Retrieved from https://idiyas.com/inventor/lingna-yue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations of Lingna Yue in Helical Slow-Wave Structures

Introduction

Lingna Yue is an accomplished inventor based in Chengdu, China. He has made significant contributions to the field of engineering, particularly in the development of helical slow-wave structures. His innovative approach has led to advancements that enhance the efficiency and reliability of these structures.

Latest Patents

Lingna Yue holds a patent for a helical slow-wave structure that includes a helix of rectangular cross-section with grooves designed to receive supporting rods. This invention provides a solution to improve thermal contact resistance between the helix and supporting rods, thereby enhancing the capability of transferring heat out of the structure. The design allows for a higher heat capacity, making the helical slow-wave structure more firm and reliable. He has 1 patent to his name.

Career Highlights

Lingna Yue is affiliated with the University of Electronic Science and Technology of China, where he continues to engage in research and development. His work focuses on innovative solutions that address practical challenges in engineering and technology.

Collaborations

Lingna Yue has collaborated with notable colleagues, including Luwei Liu and Xiong Xu. Their combined expertise contributes to the advancement of research in their field.

Conclusion

Lingna Yue's contributions to the field of helical slow-wave structures demonstrate his commitment to innovation and engineering excellence. His work not only enhances the performance of these structures but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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