Dayton, OH, United States of America

Linda M Lush

This inventor holds 2 USPTO granted patents. Top assignee: Eastman-Kodak Company. Active years: 1986-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Linda M Lush. Retrieved from https://idiyas.com/inventor/linda-m-lush

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1986-1987

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Linda M. Lush

Introduction

Linda M. Lush is a prominent inventor based in Dayton, OH (US). She has made significant contributions to the field of continuous ink jet printing, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include a "Method and apparatus for sensing satellite ink drop charge and adjusting" and a "Method and apparatus for adjusting stimulation amplitude in continuous ink jet printing." The first patent focuses on adjusting ink pressure by detecting the fractional charge imparted to satellite drops. The second patent involves sensing the stimulation amplitude at which infinite satellites are first produced and adjusting the stimulation accordingly.

Career Highlights

Linda is currently employed at Eastman Kodak Company, where she continues to push the boundaries of technology in her field. Her work has been instrumental in enhancing the performance and efficiency of ink jet printers.

Collaborations

She has collaborated with notable coworkers, including Hilarion Braun and Scott D. Lehman, contributing to a dynamic and innovative work environment.

Conclusion

Linda M. Lush's contributions to the field of ink jet printing exemplify her dedication to innovation and technology. Her patents reflect her commitment to advancing the industry and improving printing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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