Linda Lee Stenzel

Title: Discovering Innovations by Linda Lee Stenzel

Introduction

Linda Lee Stenzel, an accomplished inventor based in Mount Hermon, California, holds two significant patents that reflect her contributions to the field of physical vapor deposition technology. Her innovative methods are geared towards enhancing the efficiency and reliability of sputter processing, which is vital for various applications in semiconductor manufacturing.

Latest Patents

One of Linda's latest patents, titled "Pasting Method for Eliminating Flaking During Nitride Sputtering," addresses the challenge of metal or metal-derived material flaking during sputter processing of substrates. This invention is particularly beneficial for non-planar sputter targets. By modulating the magnetic field configuration in a sputter apparatus during a pasting process, her method effectively inhibits flaking from the target, shield, or internal components. The pasting methods include encapsulation and, if necessary, material removal via high-density plasma erosion.

Another noteworthy patent is for an "Apparatus and Method for Improving Film Uniformity in a Physical Vapor Deposition System." This system integrates a hollow cathode magnetron equipped with a downstream plasma control mechanism. The innovation involves a hollow cathode with a non-planar target, paired with at least one electromagnetic coil to generate and sustain plasma. The setup also incorporates an anode positioned between the cathode and the control mechanism, which features multiple electromagnetic coils arranged to form a tapered magnetic convergent lens.

Career Highlights

Linda Lee Stenzel has made significant strides in her career as an inventor while working at Novellus Systems Incorporated. Her work primarily focuses on advancing technologies related to sputtering processes, enhancing film deposition methods, and improving the overall efficiency of semiconductor manufacturing techniques.

Collaborations

Throughout her career, Linda has collaborated with esteemed colleagues such as Jean Qing Lu and Jeffrey A Tobin. These collaborative efforts have likely enriched her innovative approach and contributed to the successful development of her patented technologies.

Conclusion

Linda Lee Stenzel's contributions to the field of physical vapor deposition technology underscore her innovative spirit and dedication to advancing semiconductor manufacturing processes. Her patents not only address existing challenges in the industry but also pave the way for future innovations that may further enhance the efficiency and reliability of sputtering techniques.