Santa Fe, NM, United States of America

Linda B Braly


Average Co-Inventor Count = 3.1

ph-index = 3

Forward Citations = 93(Granted Patents)


Location History:

  • Santa Fe, NM (US) (2006)
  • Albany, CA (US) (2007)
  • Oakland, CA (US) (2007 - 2014)

Company Filing History:


Years Active: 2006-2014

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6 patents (USPTO):Explore Patents

Title: Linda B. Braly: Innovator in Plasma Etch Technology

Introduction

Linda B. Braly is a prominent inventor based in Santa Fe, NM (US). She has made significant contributions to the field of plasma etch technology, holding a total of 6 patents. Her work focuses on improving the manufacturing processes of electronic devices, particularly in achieving uniformity in etched features.

Latest Patents

One of her latest patents is a plasma etch method designed to reduce micro-loading. This innovative method allows for the production of a plurality of etched features in electronic devices while avoiding micro-loading problems. It maintains more uniform sidewall profiles and critical dimensions. The process involves performing a first time-divisional plasma etch step within a plasma chamber, followed by a flash process step to remove any polymers from the etched features. This method can be repeated until the desired etch depth is achieved.

Another notable patent addresses profile and critical dimension uniformity control through plasma oxidation treatment. This invention includes an apparatus for forming spacers, featuring a plasma processing chamber equipped with various components such as a substrate support and a gas inlet. The method involves providing a plasma oxidation treatment to form a silicon oxide coating over the spacer layer, ensuring high-quality etching results.

Career Highlights

Linda B. Braly is currently employed at Lam Research Corporation, where she continues to advance her research in plasma etch technology. Her work has been instrumental in enhancing the efficiency and effectiveness of etching processes in the semiconductor industry.

Collaborations

Throughout her career, Linda has collaborated with notable colleagues, including Vahid Vahedi and Qinghua Zhong. These partnerships have contributed to the development of innovative solutions in the field of plasma processing.

Conclusion

Linda B. Braly's contributions to plasma etch technology have significantly impacted the manufacturing of electronic devices. Her innovative methods and collaborative efforts continue to drive advancements in the industry.

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