Qingdao, China

Lin Yu

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Hisense Broadband Multimedia Technologies, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lin Yu. Retrieved from https://idiyas.com/inventor/lin-yu-f49sjbie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Lin Yu - Innovator in Light Emission Technology

Introduction

Lin Yu is a prominent inventor based in Qingdao, China. He has made significant contributions to the field of optical technology, particularly through his innovative patent related to light emission assemblies. His work is instrumental in advancing the capabilities of optical modules.

Latest Patents

Lin Yu holds a patent for a light emission assembly and an optical module. This invention includes a substrate and at least two channels, which feature a driving assembly with a driving chip and an EML laser assembly. The assembly incorporates various components such as magnetic beads, a DC blocking capacitor, and multiplexing pads that facilitate electrical connections. This technology enhances the efficiency and functionality of light emission systems.

Career Highlights

Lin Yu is currently employed at Hisense Broadband Multimedia Technologies, Ltd., where he continues to develop innovative solutions in multimedia technology. His expertise in optical systems has positioned him as a key player in his field.

Collaborations

Lin collaborates with talented coworkers, including Jiaao Zhang and Xinnan Wang, who contribute to the innovative environment at Hisense Broadband Multimedia Technologies, Ltd.

Conclusion

Lin Yu's contributions to light emission technology exemplify his dedication to innovation and advancement in optical systems. His patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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