Lin Tsai-Sen

Title: Lin Tsai-Sen: Innovator in Semiconductor Technology

Introduction

Lin Tsai-Sen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods to enhance the durability of metallic layers in semiconductor chips. His innovative approach addresses critical challenges faced during the manufacturing process.

Latest Patents

Lin Tsai-Sen holds a patent for a method aimed at preventing corrosion of a metallic layer of a semiconductor. This invention provides a solution to the corrosion issues caused by chlorine atoms that can reside on the side walls of trenches in aluminum-containing metallic layers after trench etching. The patent outlines a three-step process: first, removing the photoresist layer through ashing at temperatures between 178°C and 200°C; second, washing the semiconductor chip with an acidic solution containing hydroxylamine, hydroquinone, monoethanolamine, and water; and third, heating the chip at temperatures between 200°C and 250°C to eliminate chlorine atoms and prevent recurrent corrosion.

Career Highlights

Lin Tsai-Sen is associated with Mosel Vitelic Corporation, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's reputation but has also paved the way for further innovations in the industry.

Collaborations

Lin has collaborated with notable colleagues, including Tings Wang and Chou-Shin Jou. Their combined expertise has fostered a productive environment for innovation and development within their field.

Conclusion

Lin Tsai-Sen's contributions to semiconductor technology exemplify the importance of innovation in addressing industry challenges. His patented method for preventing corrosion in metallic layers showcases his commitment to advancing technology and improving manufacturing processes.