Lin Lin Sun

Title: Lin Lin Sun: Innovator in Semiconductor Technology

Introduction

Lin Lin Sun is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work has implications for the future of electronic devices and materials.

Latest Patents

Lin Lin Sun holds a patent for a semiconductor structure and fabrication method. This patent outlines a method that includes providing a to-be-etched layer, forming an initial mask layer over it, and creating a patterned structure. The process involves exposing a portion of the initial mask layer, forming a barrier layer, and performing an ion doping process to create doped and un-doped regions. The method concludes with the formation of a mask layer that includes an opening exposing the top surface of the to-be-etched layer.

Career Highlights

Throughout his career, Lin Lin Sun has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in both Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Lin Lin Sun has collaborated with several professionals in his field, including Qian Jiang Zhang and Bo Su. These collaborations have likely enriched his work and contributed to the development of innovative solutions in semiconductor fabrication.

Conclusion

Lin Lin Sun is a key figure in semiconductor innovation, with a patent that showcases his expertise and creativity. His contributions to the industry are significant and continue to influence the development of new technologies.