Lin I

Title: Lin I: Innovator in Plasma Processing Technology

Introduction

Lin I is a notable inventor based in Piermont, NY (US), recognized for his contributions to plasma processing technology. He holds a patent for a unique substrate support electrode that enhances the efficiency of plasma processing equipment. His innovative approach has the potential to significantly impact various applications in the field.

Latest Patents

Lin I's most recent patent is titled "Shaped field magnetron electrode." This invention features a book-shaped prismatic body that contains a magnet core with flange-like pole pieces at each end. These components work together to create a longitudinal magnetic field wrapped around the electrode body. An auxiliary field-shaping magnet is strategically positioned to flatten the magnetic field adjacent to the electrode support surface, resulting in a thin plasma of substantially uniform thickness close to the electrode surface. This advancement is crucial for improving the performance of plasma processing equipment.

Career Highlights

Lin I is currently employed at Materials Research Corporation, where he applies his expertise in developing innovative technologies. His work has led to significant advancements in the field of plasma processing, showcasing his commitment to innovation and excellence.

Collaborations

Lin I has collaborated with esteemed colleagues, including Walter H Class and Steven D Hurwitt. Their combined efforts have contributed to the development of cutting-edge technologies in the industry.

Conclusion

Lin I's contributions to plasma processing technology through his innovative patent demonstrate his significant role as an inventor. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.