Liming Zhang

Title: Liming Zhang: Innovator in Semiconductor Cleaning Solutions

Introduction

Liming Zhang is a prominent inventor based in Sunnyvale, CA, known for his significant contributions to the field of semiconductor technology. With a total of 9 patents to his name, he has developed innovative solutions that address critical challenges in semiconductor manufacturing.

Latest Patents

One of his latest patents focuses on methods and apparatus for cleaning semiconductor substrates after polishing copper films. This invention describes a cleaning solution that combines deionized water, an organic compound, and a fluoride compound in an acidic pH environment. This solution effectively cleans the surface of semiconductor substrates after the chemical mechanical polishing of copper layers. The methods alleviate issues related to brush loading and contamination. Another notable patent involves a cleaning solution formed by mixing citric acid, ammonium fluoride, and hydrogen fluoride in deionized water. This solution is designed to maintain a pH of about 4, ensuring optimal cleaning performance for polished copper layers.

Career Highlights

Throughout his career, Liming Zhang has worked with leading companies in the semiconductor industry, including VLSI Technology, Inc. and Lam Research Corporation. His experience in these organizations has allowed him to refine his expertise and contribute to advancements in semiconductor cleaning technologies.

Collaborations

Liming has collaborated with notable professionals in his field, including Yuexing Zhao and Diane J. Hymes. These collaborations have further enriched his work and led to innovative solutions in semiconductor processing.

Conclusion

Liming Zhang's contributions to semiconductor cleaning solutions demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and provide effective solutions to enhance the cleaning process.