This inventor holds 1 USPTO granted patent. Top assignee: Hubei Dinglong Co., Ltd.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Lili Mei - Innovator in Weather-Resistant Technology
Introduction
Lili Mei is a prominent inventor based in Wuhan, China. She has made significant contributions to the field of materials science, particularly with her innovative designs that enhance product durability and functionality. Her work is characterized by a commitment to developing solutions that meet the demands of modern technology.
Latest Patents
Lili Mei holds a patent for a weather-resistant polishing pad. This invention includes an upper layer designed for polishing, a buffer layer, and a transparent base. The buffer layer is strategically placed between the upper layer and the transparent base, with all components bonded using a pressure-sensitive adhesive or an adhesive agent. The upper layer is composed of a weather-resistant polyurethane prepolymer, a curing agent, and a functional filler. Notably, the polyurethane prepolymer is a polymerization product of polyol and polyfunctional isocyanate, which includes a first isocyanate that may or may not contain a benzene ring.
Career Highlights
Lili Mei is currently employed at Hubei Dinglong Co., Ltd., where she continues to innovate and develop new technologies. Her work has garnered attention for its practical applications and effectiveness in various industries.
Collaborations
Lili has collaborated with notable coworkers, including Shunquan Zhu and Yunfeng Li, who have contributed to her projects and research endeavors.
Conclusion
Lili Mei's contributions to the field of weather-resistant materials exemplify her innovative spirit and dedication to advancing technology. Her patent for the weather-resistant polishing pad showcases her ability to create practical solutions that address real-world challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile