Albany, CA, United States of America

Lili Ji


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Lili Ji in X-ray Production Technology

Introduction

Lili Ji is an accomplished inventor based in Albany, CA (US). She has made significant contributions to the field of X-ray production technology. Her innovative work focuses on high brightness multiple beamlets sources, which have the potential to revolutionize lithography and remote detection applications.

Latest Patents

Lili Ji holds a patent for a technology titled "High brightness—multiple beamlets source for patterned X-ray production." This patent describes techniques for controllably directing beamlets to a target substrate. The beamlets can be either positive ions or electrons, with a demonstrated diameter of 1 µm and inter-aperture spacings of 12 µm. This array of beamlets can be utilized for maskless lithography, allowing for direct e-beam writing of individual devices. The high brightness of the beamlets minimizes exposure times for lithographic applications. Additionally, the beamlets can be used for X-ray production, providing patterned exposures for medical imaging techniques such as CAT scans. This technology also has potential applications in the remote detection of explosives.

Career Highlights

Lili Ji is affiliated with the University of California, where she continues to advance her research and development in innovative technologies. Her work has garnered attention for its practical applications and contributions to the scientific community.

Collaborations

Lili Ji collaborates with notable colleagues, including Ka-Ngo Leung and Qing Ji. Their combined expertise enhances the research and development efforts in their respective fields.

Conclusion

Lili Ji's innovative contributions to X-ray production technology exemplify the impact of her work on both scientific research and practical applications. Her patent and ongoing research continue to pave the way for advancements in lithography and detection technologies.

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