The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Jun. 01, 2007
Ka-ngo Leung, Hercules, CA (US);
Qing Ji, Albany, CA (US);
William A. Barletta, Oakland, CA (US);
Ximan Jiang, El Cerrito, CA (US);
Lili Ji, Albany, CA (US);
Ka-Ngo Leung, Hercules, CA (US);
Qing Ji, Albany, CA (US);
William A. Barletta, Oakland, CA (US);
Ximan Jiang, El Cerrito, CA (US);
Lili Ji, Albany, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Techniques for controllably directing beamlets to a target substrate are disclosed. The beamlets may be either positive ions or electrons. It has been shown that beamlets may be produced with a diameter of 1 μm, with inter-aperture spacings of 12 μm. An array of such beamlets, may be used for maskless lithography. By step-wise movement of the beamlets relative to the target substrate, individual devices may be directly e-beam written. Ion beams may be directly written as well. Due to the high brightness of the beamlets from extraction from a multicusp source, exposure times for lithographic exposure are thought to be minimized. Alternatively, the beamlets may be electrons striking a high Z material for X-ray production, thereafter collimated to provide patterned X-ray exposures such as those used in CAT scans. Such a device may be used for remote detection of explosives.