Lili Feng

Title: Lili Feng: Innovator in Nanostructure Technology

Introduction

Lili Feng is a prominent inventor based in San Jose, California. She has made significant contributions to the field of nanostructure technology, holding two patents that showcase her innovative approach to complex engineering challenges. Her work is instrumental in advancing the capabilities of semiconductor manufacturing.

Latest Patents

Lili Feng's latest patents include "Self Aligned Multiple Patterning" and "Fully Self-Aligned Subtractive Etch." The first patent describes a method for forming a nanostructure on a substrate through a series of lithography-and-etch processes. This method involves patterning a mandrel layer, performing spacer patterning, and executing gap-filling processes to create intricate nanostructures. The second patent outlines apparatuses and methods for providing fully self-aligned metallization lines and vias, enhancing the efficiency and precision of semiconductor devices.

Career Highlights

Lili Feng is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her role involves developing innovative solutions that push the boundaries of technology in manufacturing processes. Her expertise in nanostructure technology has positioned her as a key player in her field.

Collaborations

Lili has collaborated with notable coworkers, including Madhur Sachan and Regina Germanie Freed. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Lili Feng's contributions to nanostructure technology and her innovative patents reflect her dedication to advancing the semiconductor industry. Her work at Applied Materials, Inc. continues to influence the future of technology and manufacturing processes.