Shanghai, China

Lijun Du

This inventor holds 1 USPTO granted patent. Top assignee: Changshu 3F Zhonghao New Chemical Materials Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lijun Du. Retrieved from https://idiyas.com/inventor/lijun-du-bpksku7x

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Lijun Du and Advances in Gas Separation Membranes.

Introduction

Lijun Du is an inventor based in Shanghai, China. Du is associated with Changshu 3F Zhonghao New Chemical Materials Co., Ltd. and is named on a patent concerning gas separation membrane technology.

Latest Patents

Du’s listed patent, “Gas Separation Membrane, and Preparation Method Therefor and Use Thereof,” describes a membrane containing 60–100 mol% of monomeric units derived from α,β,β-trifluorostyrene. The patent specifies an intrinsic viscosity of 0.5–5.0 dL/g and a tensile strength of at least 50 MPa. Under the GB/T 1038-2000 test method, the membrane’s hydrogen permeability coefficient is at least 100 barrer. Du is credited with 1 patent in the information provided.

Career Highlights

The patent reflects Du’s work on polymer-based materials designed for gas separation. Its stated properties address membrane strength and hydrogen permeability, while the described preparation method and uses relate to applying the material in gas-separation processes.

Collaborations

The provided information lists Xingxing Sun and Shuyu Liu as Du’s coworkers. It does not specify their roles or whether they collaborated on the patent.

Conclusion

Lijun Du’s listed patent focuses on a trifluorostyrene-based gas separation membrane with specified mechanical and hydrogen-permeability properties, highlighting a contribution to membrane materials technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…