Shanghai, China

Lihao Yang

This inventor holds 1 USPTO granted patent. Top assignee: Glenfly Tech Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lihao Yang. Retrieved from https://idiyas.com/inventor/lihao-yang-p9w2xjqi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Lihao Yang in Texture Sampling Technology.

Introduction

Lihao Yang is an accomplished inventor based in Shanghai, China. He has made significant contributions to the field of texture sampling technology. His innovative approach has led to the development of a unique method that enhances the efficiency of texture sampling processes.

Latest Patents

Lihao Yang holds a patent for a "Texture sampling method and apparatus based on merge processing of texel requests." This patent focuses on merging target texel requests within the same cache line, which effectively reduces the number of cache hit tests. By doing so, it alleviates pressure on the cache of the next level, thereby increasing the speed of texture sampling. The method involves creating a texture sampling request that includes a pixel to be processed, obtaining multiple target texel requests based on pixel coordinates, and performing merge processing according to a preset rule.

Career Highlights

Lihao Yang is currently employed at Glenfly Tech Co., Ltd., where he continues to innovate and develop new technologies. His work has garnered attention for its practical applications in improving texture sampling efficiency.

Collaborations

Lihao Yang collaborates with talented coworkers, including Jing Feng and Ziwen Zhu. Their combined expertise contributes to the advancement of technology within their field.

Conclusion

Lihao Yang's contributions to texture sampling technology demonstrate his innovative spirit and commitment to enhancing efficiency in this area. His patent reflects a significant advancement that could influence future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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