Lommel, Belgium

Lieven Stalmans

This inventor holds 2 USPTO granted patents. Top assignee: Imec Vzw. Active years: 2004.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2004

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2 patents (USPTO):Explore Patents

Title: The Innovations of Lieven Stalmans

Introduction

Lieven Stalmans is a notable inventor based in Lommel, Belgium. He has made significant contributions to the field of opto-electronic devices, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of thin-film devices.

Latest Patents

Stalmans' latest patents include a thin-film opto-electronic device and a method of making it. This device is designed on a conductive silicon-containing substrate and features a sequence of layers. The layers consist of a porous medium, preferably porous silicon, which provides both light diffusing and light reflecting properties. Additionally, a non-porous layer is placed on the porous silicon layer, incorporating regions of different conductivity types. This innovative design allows for optical confinement within the device. Another patent also pertains to a thin-film opto-electronic device fabricated on a silicon-containing substrate, utilizing a crystalline semiconductor material. The inclusion of a porous silicon layer enhances the device's efficiency by facilitating light confinement.

Career Highlights

Lieven Stalmans is currently associated with Imec Vzw, a leading research and innovation hub in nanoelectronics and digital technologies. His work at Imec has positioned him at the forefront of advancements in opto-electronic devices.

Collaborations

Stalmans collaborates with esteemed colleagues such as Johan F Nijs and Matty Caymax, contributing to a dynamic research environment that fosters innovation.

Conclusion

Lieven Stalmans is a prominent figure in the field of opto-electronic devices, with a focus on enhancing device efficiency through innovative designs. His contributions continue to impact the industry significantly.

Profile summary based on public USPTO records.
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