Wetteren, Belgium

Lieven Jacob De Clercq

This inventor holds 1 USPTO granted patent. Top assignee: Xeikon N.v.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lieven Jacob De Clercq. Retrieved from https://idiyas.com/inventor/lieven-jacob-de-clercq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: The Innovations of Lieven Jacob De Clercq

Introduction

Lieven Jacob De Clercq is a notable inventor based in Wetteren, Belgium. He has made significant contributions to the field of printing technology, particularly with his innovative approach to non-impact printing.

Latest Patents

De Clercq holds a patent for a non-impact printer with evenness control. This invention describes a printer designed to form images on various media without the need for traditional impact methods. His patent is a testament to his commitment to advancing printing technology.

Career Highlights

Lieven Jacob De Clercq is associated with Xeikon N.V., a company known for its cutting-edge digital printing solutions. His work at Xeikon has allowed him to explore and develop new technologies that enhance the efficiency and quality of printing processes.

Collaborations

Throughout his career, De Clercq has collaborated with talented individuals such as Erik Marcel Bollansee and Lucien A De Schamphelaere. These partnerships have contributed to the development of innovative solutions in the printing industry.

Conclusion

Lieven Jacob De Clercq's contributions to non-impact printing technology highlight his role as a forward-thinking inventor. His patent and work at Xeikon N.V. reflect his dedication to innovation in the printing sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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