Singapore, Singapore

Licheng Marshal Han

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Licheng Marshal Han. Retrieved from https://idiyas.com/inventor/licheng-marshal-han-ejf3f88q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Licheng Marshal Han: Innovator in Polymer Technology

Introduction

Licheng Marshal Han is a prominent inventor based in Singapore, known for his contributions to polymer technology. He has developed innovative methods that enhance the performance of integrated circuits, particularly in the area of dielectric materials.

Latest Patents

Licheng holds a patent for a method of forming a polymer on a surface. This patent, titled "Pulsed plasma deposition of polymers as dielectrics for integrated circuit interconnects," addresses the challenge of filling minimal gaps and achieving thermal stability in polymers. The process involves using plasma off times that are sufficiently long to dissipate energy input, followed by an annealing step to remove occluded monomers and small oligomers.

Career Highlights

Licheng is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of polymer applications in electronics. His work has significantly impacted the field, leading to advancements in the reliability and efficiency of integrated circuits.

Collaborations

Licheng has collaborated with notable colleagues, including Wei William Lee and Richard B Timmons, who share his passion for innovation in technology.

Conclusion

Licheng Marshal Han's contributions to polymer technology exemplify the spirit of innovation in the field of electronics. His work not only enhances the performance of integrated circuits but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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