Libbert Peng

Title: Libbert Peng: Innovator in Semiconductor Processing

Introduction

Libbert Peng is a pioneering inventor based in Shanghai, China, who has made significant contributions to the field of semiconductor processing. With a focus on innovative techniques, Peng holds a patent that showcases a method for the self-aligned formation of a gate polysilicon layer, which enhances the efficiency and performance of semiconductor devices.

Latest Patents

Peng’s patent, titled "Method and Structure for Self-Aligned Formation of a Gate Polysilicon Layer," details a sophisticated approach to processing semiconductor devices. This method involves several steps, including the formation of a pad oxide layer and a silicon nitride layer over the substrate. The process includes creating a trench region that extends into the semiconductor substrate, filling it with an oxide material, followed by planarization of the oxide material. The final steps involve the selective removal of the silicon nitride layer to create an isolation structure, onto which polysilicon material is deposited. This process results in the formation of distinct electrode structures that enhance device functionality.

Career Highlights

Libbert Peng currently works at Semiconductor Manufacturing International Corporation, a leading company in the semiconductor industry. His role at this prominent institution has allowed him to advance technologies that support modern electronic devices. His expertise in semiconductor processing underpins his work and achievements.

Collaborations

Throughout his career, Peng has collaborated with notable coworkers such as Li Jiang and Ying Shao, both of whom contribute to the innovative efforts at Semiconductor Manufacturing International Corporation. These collaborations inspire a dynamic exchange of ideas and techniques, further advancing the field of semiconductor technology.

Conclusion

As an inventor, Libbert Peng exemplifies the innovative spirit in the semiconductor industry. Through his well-defined patent, he continues to play a vital role in shaping the future of semiconductor processing, ensuring improved efficiency and functionality in modern electronics. His contributions are a testament to the potential of innovation in enhancing technological capabilities.