Jiaxing, China

Liangjun Lu

This inventor holds 1 USPTO granted patent. Top assignee: Finisar Shanghai Incorporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liangjun Lu. Retrieved from https://idiyas.com/inventor/liangjun-lu-zdo6hw9i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Liangjun Lu in Photonics Integrated Circuits

Introduction

Liangjun Lu is a prominent inventor based in Jiaxing, China. He has made significant contributions to the field of photonics integrated circuits (PICs). His innovative work focuses on enhancing modulation techniques, which are crucial for various optical applications.

Latest Patents

Liangjun Lu holds a patent for a "Reconfigurable PIC architecture for both phase and amplitude modulation." This patent describes a photonics integrated circuit chip that includes an input unit with optical inputs and outputs, a modulation unit with light modulators, and two stages of optical switch units. Each optical switch can be configured in various modes, allowing for versatile applications in optical communication.

Career Highlights

Liangjun Lu is currently employed at Finisar Shanghai Incorporation, where he continues to develop cutting-edge technologies in photonics. His work has been instrumental in advancing the capabilities of integrated circuits, making them more adaptable and efficient.

Collaborations

Liangjun Lu collaborates with talented coworkers, including Yao Sun and Po Dong. Their combined expertise contributes to the innovative projects at Finisar Shanghai Incorporation.

Conclusion

Liangjun Lu's contributions to the field of photonics integrated circuits demonstrate his commitment to innovation and excellence. His patent and ongoing work at Finisar Shanghai Incorporation highlight the importance of advancements in optical technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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