Eden Prairie, MN, United States of America

Liangju Lu

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Detector Electronics Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liangju Lu. Retrieved from https://idiyas.com/inventor/liangju-lu-tn8xpj5n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Liangju Lu

Introduction

Liangju Lu is a notable inventor based in Eden Prairie, MN (US). He has made significant contributions to the field of gas detection technology. His work is characterized by a focus on enhancing the reliability and efficiency of gas detection systems.

Latest Patents

Liangju Lu holds a patent for an open path gas detector. This innovative device includes imaging or non-imaging optical components. The detector is designed to accommodate misalignment of radiation received by the detector of about 1 degree without triggering false alarms. Additionally, it features a beam splitter or a wavelength-division multiplexing filter, which allows for improved detection of radiation by the sensors.

Career Highlights

Liangju Lu is currently employed at Detector Electronics Corporation. His role at the company has allowed him to develop and refine his inventions, contributing to advancements in safety and detection technologies.

Collaborations

Liangju has worked alongside colleagues such as John D. King and John King. Their collaborative efforts have furthered the development of innovative solutions in the field of gas detection.

Conclusion

Liangju Lu's contributions to gas detection technology exemplify the impact of innovative thinking in engineering. His patent for the open path gas detector showcases his commitment to enhancing safety measures in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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