Company Filing History:
Years Active: 2024
Title: Liane Manuela Matthes: Innovator in Metrology Systems
Introduction
Liane Manuela Matthes is a prominent inventor based in San Diego, California. She has made significant contributions to the field of metrology, particularly in the calibration of extreme ultraviolet light sources. Her innovative work has led to the development of a unique patent that enhances the precision of light beam measurements.
Latest Patents
Liane holds a patent for a "Calibration system for an extreme ultraviolet light source." This metrology system includes a light beam metrology apparatus that senses various aspects of an amplified light beam. It also features a target metrology apparatus that measures properties of a modified target after interaction with the amplified light beam. The system determines the moment when the modified target achieves a reference calibration state. Additionally, a control apparatus processes this information to provide a light beam calibration state to the metrology apparatus.
Career Highlights
Liane is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. Her role involves working on advanced technologies that are crucial for the development of next-generation lithography systems. Liane's expertise in metrology has positioned her as a key player in her field.
Collaborations
Throughout her career, Liane has collaborated with notable colleagues, including Daniel Jason Riggs and Rilpho Ludovicus Donker. These partnerships have fostered innovation and contributed to the success of various projects within the company.
Conclusion
Liane Manuela Matthes is a trailblazer in the field of metrology, with her innovative patent showcasing her expertise and dedication. Her work continues to influence advancements in light source calibration, making her a significant figure in the industry.