Li-tso Huang

Title: Innovations of Li-tso Huang

Introduction

Li-tso Huang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of wafer processing technology. With a total of 2 patents, his work focuses on enhancing the efficiency of cleaning and etching processes for semiconductor wafers.

Latest Patents

Li-tso Huang's latest patents include a "Single wafer spin cleaning apparatus with soaking, cleaning, and etching functions." This invention features a spin driver device, a wafer spin chuck, and a wafer support disk. The design allows for efficient soaking and cleaning of wafers in a processing liquid. Another significant patent is the "Multifunctional single wafer soaking-spinning-cleaning device and wafer processing method." This invention outlines a comprehensive method that includes multiple steps for wafer processing, ensuring thorough cleaning and etching.

Career Highlights

Throughout his career, Li-tso Huang has worked with companies such as Grand Process Technology Corporation and Grand Process Technology Corp. His expertise in wafer processing has positioned him as a valuable asset in the industry.

Collaborations

Li-tso Huang has collaborated with notable colleagues, including Hsiu-kai Chang and Chin-yuan Wu. Their combined efforts have contributed to advancements in wafer processing technologies.

Conclusion

Li-tso Huang's innovative patents and career achievements highlight his significant role in the semiconductor industry. His contributions continue to influence the efficiency of wafer processing technologies.