Li-Te Chang

Title: Innovations by Li-Te Chang in Substrate Etching

Introduction

Li-Te Chang is an accomplished inventor based in Sunnyvale, CA, known for his significant contributions to the field of substrate etching. With a total of two patents to his name, Chang has developed innovative methods that enhance the efficiency and effectiveness of etching processes in semiconductor manufacturing.

Latest Patents

Chang's latest patents focus on integrated cleaning processes for substrate etching. One of his notable inventions is a method for removing etchant byproducts from an etch reactor while discharging a substrate from an electrostatic chuck. This process involves using a first plasma to etch layers on a substrate, generating etchant byproducts. After etching, a second plasma is introduced to trim the photoresist and eliminate the byproducts. The substrate is then electrostatically discharged and removed from the chamber. Another patent details a similar method, emphasizing the use of an oxygen-containing plasma to effectively clean the etch reactor without the need for in-situ cleaning between substrate removals.

Career Highlights

Li-Te Chang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has significantly impacted the efficiency of etching processes, making him a valuable asset to his team and the industry.

Collaborations

Chang collaborates with talented coworkers, including Yi Zhou and Seul Ki Ahn, who contribute to the innovative environment at Applied Materials, Inc. Their combined expertise fosters advancements in semiconductor technology.

Conclusion

Li-Te Chang's innovative patents and contributions to substrate etching processes highlight his role as a key inventor in the semiconductor industry. His work continues to influence advancements in manufacturing techniques, showcasing the importance of innovation in technology.